Evaluation of the chemical and optical perturbations induced by Ar plasma on InP surface-Reference-Cited by-同舟云学术

Evaluation of the chemical and optical perturbations induced by Ar plasma on InP surface

Published:2019-11 Issue:6 Volume:37 Page:062902
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Béchu Solène¹²^ORCID,Eypert Céline³,Loubat Anais²,Vigneron Jackie²,Gaiaschi Sofia³,Chapon Patrick³,Bouttemy Muriel²,Etcheberry Arnaud²

Affiliation:

1. Institut Photovoltaïque d’Ile-de-France (IPVF), 18 Boulevard Thomas Gobert, 91120 Palaiseau, France

2. Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin-en-Yvelines, Université Paris Saclay, CNRS, 45 avenue des Etats-Unis, 78035 Versailles, France

3. HORIBA Scientific, 14 Boulevard Thomas Gobert, Passage Jobin Yvon, CS 45002, 91120 Palaiseau, France

Funder

Agence Nationale de la Recherche

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5121897

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Innovative Methodology for an Advanced Characterization of Perovskite Systems to Reach Buried Interfaces: In-Depth Profile by Coupling GD-OES and XPS;2023 IEEE 50th Photovoltaic Specialists Conference (PVSC);2023-06-11

2. Probing the chemistry of perovskite systems by XPS and GD-OES depth-profiling: Potentials and limitations;2021 IEEE 48th Photovoltaic Specialists Conference (PVSC);2021-06-20

3. Combined Pulsed RF GD-OES and HAXPES for Quantified Depth Profiling through Coatings;Coatings;2021-06-11