Preparation of atomic layer deposited vanadium dioxide thin films using tetrakis(ethylmethylamino) vanadium as precursor-Reference-Cited by-同舟云学术

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Preparation of atomic layer deposited vanadium dioxide thin films using tetrakis(ethylmethylamino) vanadium as precursor

Published:2020-09 Issue:5 Volume:38 Page:052402
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Bai Guandong¹,Niang Kham M.¹,Robertson John¹

Affiliation:

1. Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom

Funder

Horizon 2020 Framework Programme

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000353

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamic Modeling and Experimental Implementation of the Synthesis of Vanadium Oxide Films;Russian Journal of Inorganic Chemistry;2023-05

2. Thermodynamic Modeling and Experimental Implementation of the Synthesis of Vanadium Oxide Films;Журнал неорганической химии;2023-05-01

3. Chemical Vapor Deposition of Vanadium Dioxide for Thermochromic Smart Window Applications;Journal of Inorganic Materials;2023

4. Room Temperature Phase Transition of W‐Doped VO ₂ by Atomic Layer Deposition on 200 mm Si Wafers and Flexible Substrates;Advanced Optical Materials;2022-09-18

5. The metal–insulator phase change in vanadium dioxide and its applications;Journal of Applied Physics;2021-06-28

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