Author:
Gorelick S.,Sajavaara T.,Whitlow Harry J.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Improved 2D continuously variable output couplers for an exit pupil expander fabricated through ion beam etching;Applied Optics;2020-07-10
2. Resolution considerations in MeV ion microscopy and lithography;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-04
3. Review on stretchable and flexible inorganic electronics;Acta Physica Sinica;2014
4. Application of stencil masks for ion beam lithographic patterning;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-07
5. Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-02