Resolution considerations in MeV ion microscopy and lithography-Reference-Cited by-同舟云学术

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Resolution considerations in MeV ion microscopy and lithography

Published:2015-04 Issue: Volume:348 Page:53-57
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Norarat Rattanaporn,Whitlow Harry J.

Funder

Rajamangala University of Technology Lanna, Thailand

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

1. M. Abromowitz, I.A. Stegun, Handbook of Mathematical Functions with Formulas, Graphs and Mathematical Tables, United States Department of Commerce, National Bureau of Standards, 9th printing p. 360 9.1.21.

2. Mathematical Methods for Physicists;Arfken,2001

3. Fabrication of free standing resolution standards using proton beam writing;Zhang;Nucl. Instr. Meth. B,2007

4. Aperture edge scattering in MeV ion beam lithography. Part I: Scattering from a Ta aperture edge;Gorelick;J. Vac. Sci. Technol. B,2009

5. Aperture edge scattering in MeV ion beam lithography. Part II: Scattering from a rectangular aperture;Gorelick;J. Vac. Sci. Technol. B,2009

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