Hydrogenated amorphous carbon nitride films on Si(100) deposited by direct current saddle-field plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Hydrogenated amorphous carbon nitride films on Si(100) deposited by direct current saddle-field plasma-enhanced chemical vapor deposition

Published:1999-09 Issue:5 Volume:17 Page:2607-2611
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jang H. K.,Kim G.,Lee Y. S.,Whangbo S. W.,Whang C. N.,Yoo Y-Z.,Kim H. G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581919

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Soft X-ray emission spectroscopy study of characteristic bonding states and its distribution of amorphous carbon-nitride (a-CNx) films;Microscopy;2018-05-22

2. A fantastic graphitic carbon nitride (g-C3N4) material: Electronic structure, photocatalytic and photoelectronic properties;Journal of Photochemistry and Photobiology C: Photochemistry Reviews;2014-09

3. Emission Properties from Induced Structural Degradation of a-C:H Thin Film;Transactions on Electrical and Electronic Materials;2011-06-25

4. Study of White-LED Using Amorphous Carbon Nitride Grown by RF-sputtering and ECR-plasma CVD;Journal of Light & Visual Environment;2011

5. Study of Amorphous Carbon Nitride Films Aiming at White Light Emitting Devices;Japanese Journal of Applied Physics;2008-10-17

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