Ultrathin oxide films deposited using electron cyclotron resonance sputter-Reference-Cited by-同舟云学术

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Ultrathin oxide films deposited using electron cyclotron resonance sputter

Published:1999 Issue:5 Volume:17 Page:2222
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Amazawa Takao,Ono Toshiro,Shimada Masaru,Matsuo Seitaro,Oikawa Hideo

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Membrane III-V/Si DFB Laser Using Uniform Grating and Width-Modulated Si Waveguide;Journal of Lightwave Technology;2020-06-01

2. Membrane buried-heterostructure DFB laser with an optically coupled III-V/Si waveguide;Optics Express;2019-11-27

3. Dielectric Breakdown in Chemical Vapor Deposited Hexagonal Boron Nitride;ACS Applied Materials & Interfaces;2017-11-01

4. Expansion of lattice constants of aluminum nitride thin film prepared on sapphire substrate by ECR plasma sputtering method;Japanese Journal of Applied Physics;2014-10-24

5. Epitaxial Indium Tin Oxide Film Deposited on Sapphire Substrate by Solid-Source Electron Cyclotron Resonance Plasma;Japanese Journal of Applied Physics;2012-01-20

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