Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
2. Oxford Instruments Plasma Technology, North End, Bristol BS49 4AP, United Kingdom
Funder
Technische Universiteit Eindhoven
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5143896
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution;Advanced Materials Interfaces;2022-06-24
2. Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors;Journal of Vacuum Science & Technology A;2022-03
3. Atomic layer deposition of metal phosphates;Applied Physics Reviews;2022-03
4. Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries;Dalton Transactions;2022
5. Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation;ACS Catalysis;2021-02-15
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