Optical emission spectroscopic studies and comparisons of CH3F/CO2 and CH3F/O2 inductively coupled plasmas
Author:
Affiliation:
1. Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004
Funder
U.S. Department of Energy
Lam Research Corporation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.4904213
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2. Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam;Physics of Plasmas;2023-02-01
3. Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation;Physics of Plasmas;2020-09
4. Optical and Mass Spectrometric Measurements of the CH4–CO2 Dry Reforming Process in a Low Pressure, Very High Density, and Purely Inductive Plasma;The Journal of Physical Chemistry A;2020-08-14
5. Highly selective Si3N4/SiO2etching using an NF3/N2/O2/H2remote plasma. I. Plasma source and critical fluxes;Journal of Vacuum Science & Technology A;2020-03
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