Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching-Reference-Cited by-同舟云学术

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Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

Published:2008-05 Issue:3 Volume:26 Page:389-398
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Shin H.,Srivastava S. N.,Ruzic D. N.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2899332

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of an electrode-driven hydrogen plasma method for in situ cleaning of tin-based contamination;Plasma Science and Technology;2024-08-01

2. Sn Etching of Extreme Ultraviolet (EUV) Mirror Surface Using Ar–H2 Atmospheric Pressure Arc Plasma Jet;Plasma Chemistry and Plasma Processing;2023-06-09

3. Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-03

4. Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask;Applied Surface Science;2012-03

5. Sn debris cleaning by plasma in DPP EUV source systems for HVM;SPIE Proceedings;2010-03-11

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