Effect of surface roughness of the neutralization grid on the energy and flux of fast neutrals and residual ions extracted from a neutral beam source-Reference-Cited by-同舟云学术

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Effect of surface roughness of the neutralization grid on the energy and flux of fast neutrals and residual ions extracted from a neutral beam source

Published:2007 Issue:1 Volume:25 Page:258
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ranjan Alok,Helmbrecht Clemens,Donnelly Vincent M.,Economou Demetre J.,Franz Gerhard F.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Bias power dependence of reactive ion etching lag in contact hole etching using inductively coupled fluorocarbon plasma;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11

4. The potential of neutral beams for deep silicon nanostructure etching;Journal of Physics D: Applied Physics;2008-01-04

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