High-rate sputter deposition of electrochromic nickel oxide thin films using substrate cooling and water vapor injection-Reference-Cited by-同舟云学术

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High-rate sputter deposition of electrochromic nickel oxide thin films using substrate cooling and water vapor injection

Published:2018-03 Issue:2 Volume:36 Page:02C102
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Abe Yoshio¹,Yamauchi Shun¹,Kawamura Midori¹,Kim Kyung Ho¹,Kiba Takayuki¹

Affiliation:

1. Kitami Institute of Technology, 165 Koen-cho, Kitami 090-8507, Japan

Funder

Grant-in-Aid for Scientific Research (C)

Kobe Steel Ltd.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4998209

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Progress and challenges in wearable electrochromic devices: a review;Journal of Materials Science: Materials in Electronics;2023-06

2. Reactive sputter deposition of β-Ni(OH)₂ thin films in Ar + H₂O mixed gas atmosphere at a substrate temperature of −80 °C;Japanese Journal of Applied Physics;2023-04-01

3. Role of different atmosphere gasses during annealing in chemical-solution-deposition NiO thin films processing;Journal of Non-Crystalline Solids;2023-01

4. Influence of indium tin oxide residues on the electrical performance of hydrogenated amorphous silicon thin-film transistors in the backplane of active-matrix displays;Journal of Materials Chemistry C;2022

5. Incorporation of Co2+, Cu2+, and Zn2+ ions into nickel oxide thin films and their enhanced electrochemical and electrochromic performances;International Journal of Electrochemical Science;2022-01

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