Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures-Reference-Cited by-同舟云学术

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Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures

Published:2006 Issue:2 Volume:24 Page:768
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Aktary M.,Stepanova M.,Dew S. K.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 42 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal Reflow Simulation for PMMA Structures with Nonuniform Viscosity Profile;Polymers;2023-09-11

2. Cross Sections of Scattering Processes in Electron-Beam Lithography;Russian Microelectronics;2023-04

3. Cross Sections of Scattering Processes in Electron-Beam Lithography;Микроэлектроника;2023-03-01

4. Transformation and degradation of metal halide perovskites induced by energetic electrons and their practical implications;Nano Futures;2021-07-13

5. Self-organization of random copolymers to nanopatterns by localized e-beam dosing;Nanotechnology;2021-04-26

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