Nanocrystalline cobalt-based films with high thermal stability from a single molecule-Reference-Cited by-同舟云学术

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Nanocrystalline cobalt-based films with high thermal stability from a single molecule

Published:2010-01 Issue:1 Volume:28 Page:54-60
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Henderson Lucas B.,Rivers Joseph H.,Bost Daniel E.,Jones Richard A.,Ekerdt John G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3264480

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Precursor-based designs of nano-structures and their processing for Co(W) alloy films as a single layered barrier/liner layer in future Cu-interconnect;Journal of Materials Chemistry C;2015

2. CVD of cobalt–tungsten alloy film as a novel copper diffusion barrier;Microelectronic Engineering;2013-06

3. Self-Assembled Nano-Stuffing Structure in CVD and ALD Co(W) Films as a Single-Layered Barrier/Liner for Future Cu-Interconnects;ECS Journal of Solid State Science and Technology;2013

4. Synthesis and structures of Co bis-trifluoromethylpyrazolate complexes;Dalton Transactions;2013

5. CVD and ALD Co(W) Films Using Amidinato Precursors as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects;ECS Journal of Solid State Science and Technology;2013

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