Photolithographic fabrication of thin‐film metal–oxide–metal diodes with submicrometer‐square junction areas-Reference-Cited by-同舟云学术

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Photolithographic fabrication of thin‐film metal–oxide–metal diodes with submicrometer‐square junction areas

Published:1978-03 Issue:2 Volume:15 Page:389-391
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Havemann R. H.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569554

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Superconducting electron focusing and guiding based on the Andreev reflection mechanism;Applied Physics Letters;1992-01-27

2. Microfabrication as a Scientific Tool;Science;1983-07-08

3. Nanometer-Scale Fabrication Techniques;VLSI Electronics Microstructure Science;1982

4. A multilayer, high resolution, ion‐bombardment‐tolerant electron resist system;Journal of Vacuum Science and Technology;1981-11

5. Josephson edge-junction devices using E-beam lithography;IEEE Transactions on Electron Devices;1981-11

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