Realizing ferroelectric Hf0.5Zr0.5O2 with elemental capping layers-Reference-Cited by-同舟云学术

Realizing ferroelectric Hf0.5Zr0.5O2 with elemental capping layers

Published:2018-01 Issue:1 Volume:36 Page:011204
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Lin Yuh-Chen¹,McGuire Felicia¹,Franklin Aaron D.²

Affiliation:

1. Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708

2. Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708 and Department of Chemistry, Duke University, Durham, North Carolina 27708

Funder

National Science Foundation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5002558

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