Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization-Reference-Cited by-同舟云学术

Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization

Published:2017-11 Issue:6 Volume:35 Page:061312
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ide Tsubasa¹,Hossain Md. Amzad²,Nakamura Yutaro¹,Ohtsu Yasunori¹

Affiliation:

1. Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan

2. Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan and Department of Electrical and Electronic Engineering, Jessore University of Science and Technology, Jessore 7408, Bangladesh

Funder

MEXT | Japan Society for the Promotion of Science

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4999221

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