Effect of concurrent N2+ and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film-Reference-Cited by-同舟云学术

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Effect of concurrent N2+ and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film

Published:2004-03 Issue:2 Volume:22 Page:321-323
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Cao Z. X.,Oechsner H.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1644112

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nitrogen Plasma Surface Modification of Poly(3,4-ethylenedioxythiophene):Poly(styrenesulfonate) Films To Enhance the Piezoresistive Pressure-Sensing Properties;The Journal of Physical Chemistry C;2016-11-09

2. Microstructure and mechanical properties of a-CN x films prepared by bias voltage assisted PLD with carbon nitride target;Surface and Coatings Technology;2014-11

3. Light-Addressable Potentiometric Sensor with Nitrogen-Incorporated Ceramic Sm2 O3 Membrane for Chloride Ions Detection;Journal of the American Ceramic Society;2014-10-08

4. Hybrid anion and cation ion sensors with samarium oxide sensing membrane treated by nitrogen plasma immersion ion implantation;Sensors and Actuators B: Chemical;2014-02

5. Macroscopic Approach to Plasma Polymerization Using the Concept of Energy Density;Plasma Processes and Polymers;2011-07-05

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