Nitrogen Plasma Surface Modification of Poly(3,4-ethylenedioxythiophene):Poly(styrenesulfonate) Films To Enhance the Piezoresistive Pressure-Sensing Properties-Reference-Cited by-同舟云学术

Nitrogen Plasma Surface Modification of Poly(3,4-ethylenedioxythiophene):Poly(styrenesulfonate) Films To Enhance the Piezoresistive Pressure-Sensing Properties

Published:2016-11-09 Issue:45 Volume:120 Page:25977-25984
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Wang Jer-Chyi¹²,Karmakar Rajat Subhra,Lu Yu-Jen²,Wu Ming-Chung,Wei Kuo-Chen²

Affiliation:

1. Department of Electronic Engineering, Ming Chi University of Technology, Taishan District 24301, New Taipei City, Taiwan

2. Department of Neurosurgery, Chang Gung Memorial Hospital, Guishan District 33305, Taoyuan, Taiwan

Funder

Ministry of Science and Technology, Taiwan

Chang Gung Memorial Hospital, Taiwan

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.6b09642

Reference62 articles.

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