Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

Low electrical resistivity in thin and ultrathin copper layers grown by high power impulse magnetron sputtering

Published:2016-09 Issue:5 Volume:34 Page:051506
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Cemin Felipe,Lundin Daniel,Cammilleri Davide¹,Maroutian Thomas,Lecoeur Philippe,Minea Tiberiu²

Affiliation:

1. Laboratoire de Physique des Gaz et des Plasmas (LPGP), Unité Mixte de Recherche 8578 CNRS, Université Paris-Sud, 91405 Orsay, France and Institut d'Électronique Fondamentale (IEF), Unité Mixte de Recherche 8622 CNRS, Université Paris-Sud, 91405 Orsay, France

2. Laboratoire de Physique des Gaz et des Plasmas (LPGP), Unité Mixte de Recherche 8578 CNRS, Université Paris-Sud, 91405 Orsay, France

Funder

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Agence Nationale de la Recherche (ANR)

Conseil National de la Recherche Scientifique (CNRS)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4959555

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