Plasma enhanced atomic layer deposition of gallium sulfide thin films
Author:
Affiliation:
1. Department of Solid State Sciences, CoCooN, Ghent University, Krijgslaan 281/S1, 9000 Ghent, Belgium
2. Department of Inorganic and Physical Chemistry, PCN, Ghent University, Krijgslaan 281/S3, 9000 Ghent, Belgium
Funder
Hercules AUGE
UGent GOA
Agentschap voor Innovatie door Wetenschap en Technologie
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5079553
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1. Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films;Journal of Vacuum Science & Technology A;2023-10-03
2. Plasma-enhanced chemical vapor deposition of GaxS1−x thin films: structural and optical properties;Optical and Quantum Electronics;2023-08-02
3. Atomic layer deposition thin film techniques and its bibliometric perspective;The International Journal of Advanced Manufacturing Technology;2023-05-05
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5. Preparing Thin Gallium Sulphide Films via PECVD and Studying Their Properties;Russian Journal of Physical Chemistry A;2023-01
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