Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon-Reference-Cited by-同舟云学术

Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

Published:2010-03 Issue:2 Volume:28 Page:401-406
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Eyben Pierre,Clemente Francesca,Vanstreels Kris,Pourtois Geoffrey,Clarysse Trudo,Duriau Edouard,Hantschel Thomas,Sankaran Kiroubanand,Mody Jay,Vandervorst Wilfried,Mylvaganam Kausala,Zhang Liangchi

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3273895

Cited by 37 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of Sub‐Bandgap Emission and Unexpected n‐Type Behavior in Undoped Polycrystalline CdSe_xTe_1‐x;Advanced Science;2024-06-03

2. Thin-film TaAs: Developing a platform for Weyl semimetal devices;Matter;2023-09

3. Nanometer-Scale Measurement of Grid Finger Electrical Conduction Pathways to Detect Series Resistance Degradation of Utility-Scale Silicon Solar Cells;IEEE Journal of Photovoltaics;2022-11

4. Retarded boron and phosphorus diffusion in silicon nanopillars due to stress induced vacancy injection;Journal of Applied Physics;2022-02-21

5. Shear-induced chemical segregation in a Fe-based bulk metallic glass at room temperature;Scientific Reports;2021-07-01