Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
Author:
Affiliation:
1. The Kurt J. Lesker Company, 1925 PA-51, Jefferson Hills, Pennsylvania 15025
2. Materials Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802
3. Film Sense, 500 W South St #7, Lincoln, Nebraska 68522
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/6.0000454
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