Defect analysis in low temperature atomic layer deposited Al2O3 and physical vapor deposited SiO barrier films and combination of both to achieve high quality moisture barriers
Author:
Affiliation:
1. Université Grenoble-Alpes, CEA, LETI, MINATEC Campus, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France
Funder
European Commission (EC)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4947289
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