Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films-Reference-Cited by-同舟云学术

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Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films

Published:2003-11 Issue:6 Volume:21 Page:1927-1933
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Seman Michael,Wolden Colin A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1619416

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