Electrical conductance behavior of thin Ni catalyst films during intermittent direct current magnetron sputtering-Reference-Cited by-同舟云学术

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Electrical conductance behavior of thin Ni catalyst films during intermittent direct current magnetron sputtering

Published:2014-05 Issue:3 Volume:32 Page:031502
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kusumoto Yuji,Furuta Hiroshi,Sekiya Kazuki,Koji Hirofumi,Hatta Akimitsu

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4867459

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural stability and magnetic properties of Ni nanoparticles with an in situ formed surface stabilization layer of graphitic-carbon;Materials Research Bulletin;2024-01

2. Formation of Thermally Stable, High-Areal-Density, and Small-Diameter Catalyst Nanoparticles via Intermittent Sputtering Deposition for the High-Density Growth of Carbon Nanotubes;Nanomaterials;2022-01-24

3. Structural and Magnetic Properties of Ni Nanoparticles with an in Situ Formed Surface Stabilization Layer of Graphitic-Carbon;SSRN Electronic Journal;2022

4. Hydrophilic DLC Surface Induced by Nanostructures Formed by RF O₂ Plasma Etching With Metal Micromasks;IEEE Transactions on Plasma Science;2014-12

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