Correlation between sputter deposition parameters andI-Vcharacteristics in double-barrier memristive devices

Author:

Zahari Finn1,Schlichting Felix2,Strobel Julian3,Dirkmann Sven4,Cipo Julia2,Gauter Sven2,Trieschmann Jan5ORCID,Marquardt Richard1,Haberfehlner Georg6,Kothleitner Gerald67,Kienle Lorenz3,Mussenbrock Thomas5ORCID,Ziegler Martin8,Kersten Holger2,Kohlstedt Hermann1

Affiliation:

1. Nanoelectronics, Faculty of Engineering, Kiel University, 24143 Kiel, Germany

2. Institute of Experimental and Applied Physics, Kiel University, 24098 Kiel, Germany

3. Synthesis and Real Structure, Faculty of Engineering, Kiel University, 24143 Kiel, Germany

4. Kooperation Elmos Semiconductor AG/Frauenhofer-Gesellschaft IMS, 47057 Duisburg, Germany

5. Electrodynamics and Physical Electronics Group, Brandenburg University of Technology Cottbus-Senftenberg, 03046 Cottbus, Germany

6. Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria

7. Graz Centre for Electron Microscopy, 8010 Graz, Austria

8. Department of Micro- and Nanoelectronic Systems, TU Ilmenau, 98693 Ilmenau, Germany

Funder

Deutsche Forschungsgemeinschaft

Horizon 2020 Framework Programme

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

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