Kelvin probe force microscopy of beveled semiconductors-Reference-Cited by-同舟云学术

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Kelvin probe force microscopy of beveled semiconductors

Published:2002 Issue:5 Volume:20 Page:2133
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ferguson R. S.,Fobelets K.,Cohen L. F.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in AFM for the electrical characterization of semiconductors;Reports on Progress in Physics;2008-06-20

2. Two-dimensional carrier profiling on operating Si metal-oxide semiconductor field-effect transistor by scanning capacitance microscopy;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006

3. Lateral n–i–p junctions formed in an InSb quantum well by bevel etching;Semiconductor Science and Technology;2004-12-21

4. Determining the thickness and composition of SiGe heterostructures using an optical microscope;Semiconductor Science and Technology;2003-03-13

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