Photoemission study of the SiO2/Si interface structure of thin oxide films on Si(100), (111), and (110) surfaces-Reference-Cited by-同舟云学术

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Photoemission study of the SiO2/Si interface structure of thin oxide films on Si(100), (111), and (110) surfaces

Published:1991-03 Issue:2 Volume:9 Page:195-200
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Niwano Michio,Katakura Hitoshi,Takeda Yuki,Takakuwa Yuji,Miyamoto Nobuo,Hiraiwa Atsushi,Yagi Kunihiro

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577520

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