Silicon nitride etching in high- and low-density plasmas using SF6/O2/N2 mixtures-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Silicon nitride etching in high- and low-density plasmas using SF6/O2/N2 mixtures

Published:2003-03 Issue:2 Volume:21 Page:461-469
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Reyes-Betanzo C.,Moshkalyov S. A.,Swart J. W.,Ramos A. C. S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1547703

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma;Vacuum;2023-01

2. Spectroscopic Analysis of CF4/O2 Plasma Mixed with N2 for Si3N4 Dry Etching;Coatings;2022-07-27

3. Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3–27 kPa;Journal of Vacuum Science & Technology B;2022-05

4. Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films;Journal of Vacuum Science & Technology A;2021-05

5. Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching;Journal of Vacuum Science & Technology A;2020-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP