Author:
Nehmiz P.,Bohlen H.,Greschner J.
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Low energy electron beam proximity projection lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-04-01
2. Capacity of electron beam reducing image projection systems with dynamically compensated field aberrations;Microelectronic Engineering;1989-05
3. Nonresist Processes;Semiconductor Lithography;1988
4. Nanostructures;Annual Review of Materials Science;1986-08
5. Registration mark detection in electron beam proximity printing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1983