Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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1. Diffraction limited X-ray optics: technology, metrology, applications;Physics-Uspekhi;2020-01-01
2. Maskless EUV lithography, an alternative to e-beam;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-10-04
3. Maskless nanolithography on the basis of microfocus x-ray tubes: conversion of electron energy into the BeKα line;International Conference on Micro- and Nano-Electronics 2018;2019-03-15
4. Maskless X-Ray Lithography Based on Microoptical Electromechanical Systems and Microfocus X-Ray Tubes;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2018-09
5. Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11