Charge build-up reduction during biased electron cyclotron resonance plasma deposition
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Published:1995-09
Issue:5
Volume:13
Page:2004
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. Mechanism of Plasma Charging Damage III;Plasma Charging Damage;2001
2. Plasma-assisted wafer de-chucking (power-lift) process induced charging damage;2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538)