Electrical Properties of Titanium, Zirconium, and Hafnium Films from 300 °K to 1.3 °K-Reference-Cited by-同舟云学术

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Electrical Properties of Titanium, Zirconium, and Hafnium Films from 300 °K to 1.3 °K

Published:1969-01 Issue:1 Volume:6 Page:184-187
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Friebertshauser P. E.,McCamont J. W.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1492655

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of substrates and e-beam evaporation parameters on the microstructure of nanocrystalline and epitaxially grown Ti thin films;Applied Surface Science;2021-10

2. Oxidation limited thermal boundary conductance at metal-graphene interface;Carbon;2018-11

3. Conductive nitrides: Growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics;Materials Science and Engineering: R: Reports;2018-01

4. Thermodynamic description of the Ta–W–Zr system;International Journal of Materials Research;2014-11-10

5. CORRELATION OF CRITICAL TEMPERATURES AND ELECTRICAL PROPERTIES IN TITANIUM FILMS;International Journal of Modern Physics B;2003-03-10

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