Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition-Reference-Cited by-同舟云学术

Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition

Published:2020-03 Issue:2 Volume:38 Page:022404
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Mahmoodinezhad Ali¹^ORCID,Janowitz Christoph¹^ORCID,Naumann Franziska²^ORCID,Plate Paul²^ORCID,Gargouri Hassan²,Henkel Karsten¹³^ORCID,Schmeißer Dieter³^ORCID,Flege Jan Ingo¹^ORCID

Affiliation:

1. Applied Physics and Semiconductor Spectroscopy, Brandenburg University of Technology Cottbus–Senftenberg, K.-Zuse-Str. 1, 03046 Cottbus, Germany

2. SENTECH Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin, Germany

3. Applied Physics and Sensor Technology, Brandenburg University of Technology Cottbus–Senftenberg, K.-Wachsmann-Allee 17, 03046 Cottbus, Germany

Funder

Federal Ministry of Economy Affairs and Energy

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5134800

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