Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications-Reference-Cited by-同舟云学术

Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications

Published:2017-07 Issue:4 Volume:35 Page:041512
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Hennessy John¹,Moore Christopher S.²,Balasubramanian Kunjithapatham¹,Jewell April D.¹,France Kevin²,Nikzad Shouleh¹

Affiliation:

1. Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Dr., Pasadena, California 91109

2. Center for Astrophysics and Space Astronomy, University of Colorado, Boulder, Colorado 80309 and Laboratory for Atmospheric and Space Physics, University of Colorado, Boulder, Colorado 80309

Funder

Jet Propulsion Laboratory (JPL)

National Aeronautics and Space Administration (NASA)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4986945

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