Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films-Reference-Cited by-同舟云学术

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Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films

Published:2011-11 Issue:6 Volume:29 Page:061504
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Venkatasubramanian Chandrasekaran,Cabarcos Orlando M.,Drawl William R.,Allara David L.,Ashok S.,Horn Mark W.,Bharadwaja S. S. N.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3636372

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tracking optical properties of VO films to optimize polycrystalline VO2 fabrication;Thin Solid Films;2024-06

2. Influence of crystallinity and stoichiometry on the high temperature semiconductor-metal transition of lanthanum cobalt oxide deposited by reactive dc sputtering;Materials Science in Semiconductor Processing;2023-08

3. Reactive pulsed DC magnetron sputtering deposition of vanadium oxide thin films: Role of pulse frequency on the film growth and properties;Applied Surface Science;2021-10

4. Effect of O2 increase on properties of vanadium oxide coatings;Surface Engineering;2016-02-23

5. Vanadium dioxide film protected with an atomic-layer-deposited Al2O3 thin film;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-01

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