Considerations for further scaling of metal–insulator–metal DRAM capacitors-Reference-Cited by-同舟云学术

Considerations for further scaling of metal–insulator–metal DRAM capacitors

Published:2013-01 Issue:1 Volume:31 Page:01A105
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Kaczer B.,Clima S.,Tomida K.,Govoreanu B.,Popovici M.,Kim M.-S.,Swerts J.,Belmonte A.,Wang W.-C.,Afanas'ev V. V.,Verhulst A. S.,Pourtois G.,Groeseneken G.,Jurczak M.

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4767125

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