Structural damage produced in InP(100) surfaces by plasma‐employing deposition techniques
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.573335
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2. In-situ Control of Nitrogen Content and the Effect on PL Properties of SiNx Films Grown by Ion Beam Sputter Deposition;MRS Proceedings;2004
3. Formation of Luminescent Si Nanocrystals by High-Temperature Annealing of Ion-Beam-Sputtered Si/SiO2 Multilayers;MRS Proceedings;2003
4. Electrical properties of ion beam sputtered and ion assisted SiO[sub 2], SiO[sub X]N[sub Y], and SiN[sub X] films on silicon;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-03
5. Si[sub 3]N[sub 4] on GaAs by direct electron cyclotron resonance plasma assisted nitridation of Si layer in Si/GaAs structure;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-03
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