Laser-produced-plasma light source development for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

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Laser-produced-plasma light source development for extreme ultraviolet lithography

Published:2003 Issue:6 Volume:21 Page:2843
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Komori Hiroshi,Abe Tamotsu,Suganuma Takashi,Imai Yousuke,Sugimoto Yukihiko,Someya Hiroshi,Hoshino Hideo,Soumagne Georg,Takabayashi Yuichi,Mizoguchi Hakaru,Endo Akira,Toyoda Koichi,Horiike Yasuhiro

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Xe laser-plasma EUV radiation source with a wavelength near 11 nm—Optimization and conversion efficiency;Journal of Applied Physics;2019-09-09

2. Density and x-ray emission profile relationships in highly ionized high-Z laser-produced plasmas;Applied Physics Letters;2015-03-23

3. Numerical investigation of the radiation from an argon plasma generated by using a high explosive;Journal of the Korean Physical Society;2013-06

4. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source;Japanese Journal of Applied Physics;2011-06-20

5. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source;Japanese Journal of Applied Physics;2011-06-01

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