Xe laser-plasma EUV radiation source with a wavelength near 11 nm—Optimization and conversion efficiency
Author:
Affiliation:
1. Ioffe Institute, St. Petersburg 194021, Russia
Funder
Российский Фонд Фундаментальных Исследований
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference34 articles.
1. Relationship between an EUV source and the performance of an EUV lithographic system
2. K. Ota, Y. Watanabe, V. Banine, and H. Franken, in EUV Sources for Lithography, edited by V. Bakshi (SPIE Press, Bellingham, WA, 2005), Chap. 2.
3. High-power EUV lithography sources based on gas discharges and laser-produced plasmas
4. U. Stamm and K. Gäbel, in EUV Sources for Lithography, edited by V. Bakshi (SPIE Press, Bellingham, WA, 2005), Chap. 19.
5. Generation of soft X-rays and extreme ultraviolet (EUV) using a laser-irradiated gas puff target
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