Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

Published:2004 Issue:6 Volume:22 Page:2975
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Oshino Tetsuya,Takahashi Shinichi,Yamamoto Takahiro,Miyoshi Tatsuya,Shiraishi Masayuki,Komiya Takaharu,Kandaka Noriaki,Kondo Hiroyuki,Mashima Kiyoto,Nomura Kazushi,Murakami Katsuhiko,Okuyama Takeshi,Oizumi Hiroaki,Nishiyama Iwao,Okazaki Shinji

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of EUV lithography tools at Nikon;SPIE Proceedings;2011-03-17

2. Development progress of optics for extreme ultraviolet lithography at Nikon;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-10-01

3. Development progress of optics for EUVL at Nikon;Alternative Lithographic Technologies;2009-03-13

4. Development of EUV lithography tools at Nikon;SPIE Proceedings;2008-11-20

5. Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP