Performance Analysis of Hetero-Dielectric Stacked Buried Oxide on Modified Source-Drain FDSOI MOS Transistor

Author:

Rai Sudhir,Chauhan R. K.

Publisher

Springer Nature Singapore

Reference20 articles.

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2. Anvarifard, M.K., Orouji, A.A.: Proper electrostatic modulation of electric field in a reliable nano-SOI with a developed channel. IEEE Trans. Electron Dev. 65(4), 1653–1657 (2018)

3. Mishra, V.K., Rao, N.: Electrostatic investigation of intended source drain ultra thin body FD-SOI MOSFET. SILICON 12, 2819–2827 (2020)

4. Ranka, D., Rana, A.K., Yadav, R.K., Giri, D.: Performance analysis of FD-SOI MOSFET with different gate spacer dielectric. Int. J. Comput. Appl. 18(5), 22–27 (2011)

5. Cheng, K., Khakifirooz, A.: Fully depleted SOI (FDSOI) technology. Sci. China Inf. Sci. 59(6), 1 (2016)

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