Intrinsic Growth Challenges in Pulsed Laser-Deposited Al2O3/TiO2 Subnanometric Laminates as a Potential Dielectric Material for High-Density Storage Applications
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Publisher
Springer Nature Singapore
Link
https://link.springer.com/content/pdf/10.1007/978-981-99-4685-3_19
Reference5 articles.
1. ITRS homepage. http://www.itrs2.net/2022-itrs.html. Accessed 26 Dec 2022
2. Padhi PS, Ajimsha RS, Chetia SK, Das AK, Sahu VK, Misra P (2020) Reduced leakage current in Al2O3/TiO2/Al2O3 dielectric stacks grown by pulsed laser deposition. AIP Conf Proc 2265:030190-1–030190-4
3. Kahouli A, Lebedev O, Ben Elbahri M, Mercey B, Prellier W, Riedel S et al (2015) Structural and dielectric properties of subnanometric laminates of binary oxides. ACS Appl Mater Interfaces 7(46):25679–25684
4. Liu L, Mei Z, Tang A, Azarov A, Kuznetsov A, Xue Q-K, Du X (2016) Oxygen vacancies: the origin of n-type conductivity in ZnO. Phys Rev B 93(23):235305-1–235305-5
5. Ben Elbahri M, Kahouli A, Mercey B, Lebedev O, Donner W, Lüders U (2018) Study on the dielectric properties of Al2O3/TiO2 sub-nanometric laminates: effect of the bottom electrode and the total thickness. J Phys D Appl Phys 51(6):065101 (9 pp)
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