1. Y. Wei, Advanced Photolithography Theory and Application for ULSI Circuits[M] (Science Press, Beijing, 2016)
2. L. Bremer, R. Tuinier, S. Jahromi, High refractive index nanocomposite fluids for immersion lithography [J]. Langmuir 25(4), 2390–2401 (2009)
3. Semiconductor Products Catalog Version 4.3, Matheson Trigas
4. Air Product and Chemicals Inc., Catalog, 2015 325–13-188-GLB-Dec15
5. W. Karl Olander, Lupng Wang, Low Pressure Sources: Benefits and Drivers for adoption, Gases and Technology, Nov/Dec, 2002