Author:
Li Haibo,Li Bing,Liu Dejun,Neisser Mark,Breaux Caleb L.,Henderson Clifford L.
Reference7 articles.
1. S.O. Kim, H.H. Solak, M.P. Stoykovich, N.J. Ferrier, Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature 424(6947), 411 (2003)
2. C.-C. Liu, E. Franke, Y. Mignot, S. LeFevre, S. Sieg, C. Chi, L. Meli, D. Parnell, K. Schmidt, M. Sanchez, L. Singh, T. Furukawa, I. Seshadri, E.A. De Silva, H. Tsai, K. Lai, H. Truong, R. Farrell, R. Bruce, M. Somervell, D. Sanders, N. Felix, J. Arnold, D. Hetzer, A. Ko, A. Metz, M. Colburn, D. Corliss, DSA patterning options for logics and memory applications, pp 1014603–1014603-13 (2017)
3. C.-C.C. Liu, E. Franke, F.L. Lie, S. Sieg, H. Tsai, K. Lai, H. Truong, R. Farrell, M. Somervell, D. Sanders, N. Felix, M. Guillorn, S. Burns, D. Hetzer, A. Ko, J. Arnold, M. Colburn, DSA patterning options for FinFET formation at 7 nm node, pp 97770R-97770R-15 (2016)
4. N.A. Lynd, A.J. Meuler, M.A. Hillmyer, Polydispersity and block copolymer self-assembly. Prog. Polym. Sci. 33(9), 875–893 (2008)
5. L. Leibler, Theory of microphase separation in block copolymers. Macromolecules 13(6), 1602–1617 (1980)