Physical Properties of Silver Oxide Thin Film Prepared by DC Magnetron Sputtering: Effect of Oxygen Partial Pressure During Growth-Reference-Cited by-同舟云学术

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Physical Properties of Silver Oxide Thin Film Prepared by DC Magnetron Sputtering: Effect of Oxygen Partial Pressure During Growth

Published:2012-02-10 Issue:1 Volume:32 Page:28-33
ISSN:0164-0313
Container-title:Journal of Fusion Energy
language:en
Short-container-title:J Fusion Energ

Author:

Entezar Mehdi Hamid,Hantehzadeh M. R.,Valedbagi Sh.

Publisher

Springer Science and Business Media LLC

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://link.springer.com/content/pdf/10.1007/s10894-012-9509-5.pdf

Reference16 articles.

1. X.-Y. Gao, S.-Y. Wang, J. Li, Y.-X. Zheng, R.-J. Zhang, P. Zhou, Y.-M. Yang, L.-Y. Chen, Thin Solid Films 455–456, 438–442 (2004)

2. L.A. Peyser, A.E. Vinson, A.P. Bartko, R.M. Dickson, Science 291, 103 (2001)

3. M. Fujimaki, K. Awazu, J. Tominaga, J. Appl. Phys. 100, 074303 (2006)

4. U.K. Barik, S. Srinivasan, C.L. Nagendra, A. Subrahmanyam, Thin Solid Films 429, 129–134 (2003)

5. L.A.A. Pettersson, P.G. Snyder, Thin Solid Films 270, 69 (1995)

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