Optical Properties of Amorphous Silicon–Carbon Alloys (a-Si x C1-x ) Deposited by RF Co-Sputtering
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Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://link.springer.com/content/pdf/10.1007/s13369-014-1134-3.pdf
Reference35 articles.
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2. Tsvetkova, T.; Angelov, O.; Sendova-Vassileva, M.; Dimova-Malinovska, D.; Bischoff, L.; Adriaenssens, G.J.; Grudzinskie, W.; Zuk, J.: Structural and optical properties modification of a-SiC:H by Ga+ ion implantation. Vacuum 70, 467 (2003)
3. Tsvetkova, T.; Sellin, P.; Carius, R.; Angelov, O.; Dimova-Malinovska, D.; Zuk, J.: Optical contrast formation in amorphous silicon carbide with high-energy focused ion beams. Nucl. Instrum. Methods Phys. Res. B 267, 1583 (2009)
4. Kaffous, A.; Cheriet, A.; Belkacem, Y.; Gabouze, N.; Boukezzata, A.; Boukennous, Y.; Brighet, A.; Charfi, R.; Kechouane, M.; Guerbous, L.; Menous, I.; Menari, H.: Structural and optical properties of a-Si1-xCx:H film synthesized by Dc magnetron sputtering. Appl. Surf. Sci. 256, 4591 (2010)
5. Ech-chamikh, E.; Ameziane, E.L.; Bennouna, A.M.; Azizan,T.A.; Nguyen, T.; Lopez-Rios, T.: Structural and optical properties of RF-sputtered Si x C1-x :O films. Thin Solid Films 259, 18 (1995)
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