Effect of Ion Energy on Structure and Composition of Cathodic Arc Deposited Alumina Thin Films-Reference-Cited by-同舟云学术

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Effect of Ion Energy on Structure and Composition of Cathodic Arc Deposited Alumina Thin Films

Published:2005-08 Issue:4 Volume:25 Page:303-317
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Rosén Johanna,Mráz Stanislav,Kreissig Ulrich,Music Denis,Schneider Jochen M.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-004-3130-y.pdf

Reference35 articles.

1. Crystalline alumina deposited at low temperatures by ionized magnetron sputtering

2. Reactive sputter deposition of alumina films on superalloys and their high-temperature corrosion resistance

3. Hydrogen isotopes transport parameters in fusion reactor materials

4. Pulsed plasma-assisted PVD sputter-deposited alumina thin films

5. Deposition of hard crystalline Al2O3 coatings by bipolar pulsed d.c. PACVD

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