A DFT Study on the Direct CF2 Fragmentation Mechanisms of 1,3-C4F6 and 1,3-C4F6+ in Plasma-Reference-Cited by-同舟云学术

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A DFT Study on the Direct CF2 Fragmentation Mechanisms of 1,3-C4F6 and 1,3-C4F6+ in Plasma

Published:2022-10-06 Issue:1 Volume:43 Page:47-66
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Choi Heechol,Park Young Choon,Im Yeon-Ho,Kwon Deuk-Chul,Chung Sang-Young

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

https://link.springer.com/content/pdf/10.1007/s11090-022-10288-6.pdf

Reference38 articles.

1. Yoon MY, Yeom HJ, Kim JH, Chegal W, Cho YJ, Kwon DC, Jeong JR, Lee HC (2021) Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias. Phys Plasmas 28:063504

2. Nakamura S, Itano M, Aoyama H, Shibahara K, Yodoyama S, Hirose M (2003) Comparative studies of perfluorocarbon alternative gas plasmas for contact hole etch. Jpn J Appl Phys 42:5759–5764

3. Samukawa S, Mukai T (1999) Differences in radical generation due to chemical bonding of gas molecules in a high-density fluorocarbon plasma: Effects of the C=C bond in fluorocarbon gases. J Vac Sci Technol A 17:2463–2466

4. Hayashi T, Ishikawa K, Sekine M, Hori M, Kono A, Suu K (2011) Dissociation channels of c-C4F8 to CF2 radical in reactive plasma. Jpn J Appl Phys 50:036203

5. Cobos CJ, Hintzer K, Sölter L, Tellbach E, Thaler A, Troe J (2015) Shock wave study and theoretical modeling of the thermal decomposition of c-C4F8. Phys Chem Chem Phys 17:32219–32224

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