Influence of the Plasma Chemistry on the Composition of ZrOx and NbOx Thin Films Deposited by Reactive Magnetron Sputtering-Reference-Cited by-同舟云学术

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Influence of the Plasma Chemistry on the Composition of ZrOx and NbOx Thin Films Deposited by Reactive Magnetron Sputtering

Published:2006-04 Issue:2 Volume:26 Page:197-203
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Mráz Stanislav,Schneider Jochen M.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-006-9001-y.pdf

Reference26 articles.

1. Troczynski T, Cockcroft S, Wong H (1996). Key Eng Mater 122–124:451

2. Doughty GR, Hind D (1996). Key Eng Mater 122–124:145

3. Apparao KVSR, Sahoo NK, Bagchi TC (1985). Thin Solid Films 129:L71

4. Kathirgamanathan P, Ravichandran S (1995). Synth Met 74:165

5. Saito Y, Shiosaki T (1992). Jpn J Appl Phys 31 (Part 1):3164

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1. Adsorption of film-forming species on NbO and NbO2 surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-11

2. Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOxfilm growth;Plasma Sources Science and Technology;2016-01-21

3. Electrical analysis of niobium oxide thin films;Thin Solid Films;2015-06

4. Deposition of cerium oxide thin films by reactive magnetron sputtering for the development of corrosion protective coatings;Corrosion Science;2013-10

5. The spatial distribution of negative oxygen ion densities in a dc reactive magnetron discharge;Journal of Physics D: Applied Physics;2012-12-13

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